What question did this study set out to answer?

To determine the spatial distribution, lattice alignment, and underlying formation mechanisms of mirror twin grain boundaries in molecular beam epitaxy-grown monolayer WSe2–MoSe2 lateral heterojunctions.

April 14, 20232D MaterialsOpen Access

Formation mechanism of mirror twin grain boundaries in molecular beam epitaxy grown monolayer WSe2–MoSe2 lateral heterojunctions

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Authors

ZYZhoubin YuZhejiang Medicine (China)YDYawei DaiNanjing Medical University HKHannu‐Pekka KomsaTextile Research Institute

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Implication

Microscopy and computational study reveals atomic defect distribution in monolayer heterojunctions, highlighting mechanisms for nanoscale defect engineering in two-dimensional materials.

Key Points

To determine the spatial distribution, lattice alignment, and underlying formation mechanisms of mirror twin grain boundaries in molecular beam epitaxy-grown monolayer WSe2–MoSe2 lateral heterojunctions.
Synthesized monolayer WSe2–MoSe2 lateral heterojunctions via molecular beam epitaxy.
Characterized structural registry and real-time elemental substitution dynamics using atomic-resolution and in-situ annular dark-field scanning transmission electron microscopy.
Modeled thermodynamic preferences and substitution pathways using ab-initio density functional theory calculations.
Mirror twin grain boundaries formed at a notably higher density within MoSe2 domains compared to WSe2 domains, with rare defects extending continuously across the heterojunction interface.
Defects located inside WSe2 domains exhibited a Mo-dominant composition, which DFT and in-situ imaging confirmed arises from preferential Mo-for-W substitution along grain boundaries during MoSe2 growth.

Cite This Study

Yu et al. (2023) studied this question.

synapsesocial.com/papers/6a9e52a40bfbee156fd6f547 https://doi.org/10.1088/2053-1583/accd06

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Implication

Microscopy and computational study reveals atomic defect distribution in monolayer heterojunctions, highlighting mechanisms for nanoscale defect engineering in two-dimensional materials.

Formation mechanism of mirror twin grain boundaries in molecular beam epitaxy grown monolayer WSe2–MoSe2 lateral heterojunctions

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Implication

Key Points

Cite This Study

Formation mechanism of mirror twin grain boundaries in molecular beam epitaxy grown monolayer WSe2–MoSe2 lateral heterojunctions

Discussion

Member takes

Implication

Key Points

Cite This Study

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