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Polycarbonates containing thymine photodimer units were found to be decomposed by irradiation of deep-UV light at around 250nm, where thymine photodimer units dissociated to thymine units. In the presence of acid generator, the polycarbonates decomposed at both the thymine photodimer units and the carbonate units. Sensitivity as the chemical amplification resist was high. For this system, high sensitivity as EB resist was also found.
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Horito et al. (1991) studied this question.
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