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The Nb-Si bond and the local structure of the amorphous alloy system Nb 1-x Si x are studied in a wide range of concentrations x:0.2<or=x<or=0.8. The experimental approach is provided by X-ray emission spectroscopy, X-ray photoelectron spectroscopy, and X-ray diffraction measurements. The electronic properties and the bonding interaction between Nb and Si atoms are investigated for hypothetical Nb-Si structures by self-consistent pseudopotential calculations. A detailed analysis of all experimental data is given. It is found that the silicon short-range order changes considerably within the concentration interval 0.50<x<0.57. The comparison of the results obtained for the system Nb 1-x Si x with X-ray spectra of crystalline Nb 5 Si 3 and NbSi 2 implies that in the metallic phases of Nb 1-x Si x for 0.2
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Wiech et al. (1989) studied this question.
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