Photosensitive polyimides (PSPIs) and poly(benzoxazole)s (PSPBOs) are widely utilized as protection and insulating layers in manufacturing semiconductors because of their good mechanical properties, low water absorption, and low dielectric constant. In particular, chemically amplified PSPIs and PSPBOs exhibit very high sensitivity as compared to non-chemically amplified ones. This review article reports the advances in the molecular design of PSPIs and PSPBOs, as well as their potential properties.
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Fukukawa et al. (2009) studied this question.
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