Asymmetric substitution on Si in statistical copolymers of dimethylsila[1]ferrocenophane and ethylmethylsila[1]ferrocenophane, anionically block copolymerized with isoprene, is reported. These block copolymers yielded well-ordered microphase-separated structures in thin films over large areas. Such block copolymer thin films are useful for plasma-etching-assisted nanolithography.
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Roerdink et al. (2005) studied this question.
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