In-Diffusion and Annealing of Copper in Germanium

The in-diffusion and anealing of copper in germanium are examined experimentally over the temperature range 600 to 805°C, and using the experimental results, discussions are made as to whether the dissociative mechanism or the kick-out mechanism is at work in these processes. The experimental results support the theory that copper in germanium diffuses by the dissociative mechanism and the dominant point defects in germanium are vacancies.