Effect of etch holes on the capacitance and pull-in voltage in MEMS tunable capacitors

Microelectromechanical systems (MEMS) tunable capacitors, switches or actuators are widely applied in wireless communication systems. In the fabrication process etch holes are used to release the sacrificial layer with relatively large structures, which obviously affects the performance of devices. However, most researchers neglect this effect during their designing of the capacitors, switches or actuators. This article presents the theoretical calculation of the capacitance of tunable capacitors with etch holes, and analyses the deviation of the capacitance and pull-in voltage with different parameters such as the length of the plates w, the length of the etch holes w h, the air gap between the two plates d, and the number of the etch holes. To validate the theory in this article, a tunable capacitor was fabricated by surface micromachined technology. The theoretical results compare well with the experimental results.