A novel method of removing impurities from dielectric films has been developed. The removal of water and charges is accomplished by humidification and wet pretreatment followed by charge extraction with CO2 supercritical fluid (SCF). Films treated in this manner exhibit intrinsic properties, which are usually masked by moisture and impurities.
No takes yet. Share an insight, caveat, or question.
Fukuda et al. (2004) studied this question.
Synapse has enriched one closely related paper. Consider it for comparative context: