The discharge mode transition and O(5p1) production mechanism of pulsed radio frequency capacitively coupled plasma

The discharge mode transition from uniform plasma across the gas gap to the α mode happens at the rising phase of the pulsed radio frequency capacitively coupled plasma (PRF CCP). This transition is attributed to the fast increasing stochastic heating at the edge of sheath. In the second stage with the stable current and voltage amplitude, the consistency between experimental and numerical spatial-temporal 777 nm emission profile suggests that He* and He2* dominate the production of O(5p1) through dissociation and excitation of O2. Finally, the sterilization efficiency of PRF CCP is found to be higher than that of plasma jet.