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Monodisperse colloids have been synthesized from the acid labile polymer poly tert -butyl-methacrylate. They can be loaded with photoacid generator and crystallized into polymer opal photonic crystals. Irradiation with UV-light followed by baking and development with aqueous base allows subsequent patterning of the opaline films. This chemical approach makes it possible to use the self-assembly of this colloids (opal formation) to form a large-scale periodic structure and to introduce optical defects with UV-lithography.
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Lange et al. (2004) studied this question.
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