Room-temperature ultraviolet light-emitting zinc oxide micropatterns prepared by low-temperature electrodeposition and photoresist

High-quality (0001)-oriented zinc oxide (ZnO) micropatterns, 5-μm-wide microlines and 5-μm-diam microdot arrays, have been prepared on (111) Au-coated (100) Si wafer substrates by electrodeposition at 333 K in zinc nitrate aqueous solution and industrially employed positive type photoresist techniques. The ZnO micropatterns emitted ultraviolet light at photon energy of 3.25 eV due to recombination of bound excitons and visible light at 2.37 and 2.80 eV at room temperature.