Glow discharge polymerization of trimethylvinylsilane and tetramethylsilane

Glow discharge polymerizations of trimethylvinylsilane (TMVS) and tetramethylsilane (TMS) were compared. Vinyl groups in TMVS slightly contribute the polymer‐formation process only when glow discharge polymerization was performed at the W/FM parameter less than 500 MJ/kg. Elemental compositions of the polymers prepared from TMVS, which are rich in carbon content, shows strong dependence on operational conditions, the W/FM parameter; but the polymers from TMVS consist of the almost same chemical structures as those from TMS. Slight differences between the starting materials in chemical structure does not reflect on bulk properties of the formed polymers but on surface properties such as surface energy and adhesion.