Thin film materials are the significant elements of sustained technical advances achieved in the areas of magnetic devices, photonic and optoelectronic. The studies of thin film have advanced directly or indirectly the numerous innovative research areas in chemistry and solid state physics based upon the phenomena uniquely characteristic of the thickness, geometry and structure of the film. A significant prospect of this paper is to simulate the thin film flow of Maxell fluid model, featuring the relaxation time, over an unsteady rotating disk within the frame work of first order chemical reaction. The main aim here is to explore the heat and mass transfer mechanisms by incorporating the features of energy and mass fluxes caused by mass concentration and temperature gradients. Further, space and temperature dependent heat source/sink influence is considered on fluid thermal characteristics. The feasible conversion variables bring out the system of nonlinear ordinary differential equations which are executed for the numerical solution with numerical technique, called bvp4c in Matlab. The achieved outcomes illustrate that film thickness enhances with the rising disk rotation parameter, however; an opposite trend is observed for the magnetic field parameter, and Deborah number. Furthermore, enhancing values of Dufour number and simultaneously declining Soret number yield an increase in the fluid temperature.
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Ahmed et al. (2019) studied this question.
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