All‐Solution‐Processed Micro/Nanowires with Electroplate Welding as Transparent Conducting Electrodes

An all‐solution‐processed transparent conductive electrode with sheet resistance one order of magnitude smaller than conventional nanowire‐based transparent conductors has been developed. This is achieved by integrating all‐solution produced microwires with a nanowire solution and electroplating and electrowelding. Advantages of the resulting transparent conductor are indium‐free, vacuum‐free, and lithographic‐facility‐free, and metallic‐mask‐free, with small domain size (≈10 μm2), low sheet resistance (Rs < 1 Ω □−1), high optical transmittance (T > 80%), mechanical flexibility, and scalability, thus making it an excellent replacement for ITO.