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Metasurfaces offer promising possibilities for emerging photonic applications like see‐through, near‐eye displays. Vistec Electron Beam lithography systems with variable shaped beam (VSB) and cell projection (CP) technology provide a flexible solution to generate repetitive structures on large substrates. Excellent pattern fidelity is achieved in a feasible write‐time, enabling prototyping or the manufacturing of replication masters.
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Hädrich et al. (2022) studied this question.
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