A mathematical model for the concentration profile of TiCl4 at the top surface of an Incoloy 800H substrate placed inside a laser chemical vapor deposition (LCVD) reactor is developed by using the three-dimensional transient mass diffusion equation. The model is used for studying the spatial variation of the thickness of TiN dots deposited by LCVD, using a CO2 laser and a reactive atmosphere consisting of TiCl4, N2, and H2. By assuming that the chemical reaction is first-order with respect to TiCl4, and that the sticking coefficient of TiN at the substrate surface is temperature dependent, the deposited TiN film is found to have a volcanic profile under certain conditions, which is in good agreement with experimental results.
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Conde et al. (1992) studied this question.
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