We report on gate voltage dependent electron transport in modulation-doped In0.75Al0.25As/In0.75Ga0.25As heterostructures with strained InAs-inserted-channels grown on GaAs substrates. At temperatures of T=4.2 K we achieve mobilities of up to μ=215 000 cm2(V s)−1 and electron densities of nS=1.2×1012 cm−2 for the highest measured gate voltage of Vg=20 V. The electron effective mass m*=0.036 me is determined by temperature dependent Shubnikov–de Haas measurements. The observation of an anisotropic mobility when the first excited subband becomes populated proves interface scattering to be the limiting mechanism for the electron mobility.
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Richter et al. (2000) studied this question.
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