In this article we obtained a superhydrophobic patterned Ag film mainly by two steps. The first step is to fabricate a DNA film pattern through poly(dimethyldiallylammonium chloride) alternate deposition with DNA on a latent imaging film formed by the selective UV exposure of a photosensitive diazoresin/poly(acrylic acid) self-assembly (SA) film. The second step is to build up the patterned Ag film on a DNA film pattern with Ag electroless deposition. After surface modification with n -dodecanethiol the patterned Ag film, which exhibits obvious microstructures and nanostructures, will possess superhydrophobic properties and the contact angle can reach ∼162°.
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Yang et al. (2006) studied this question.
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