TiN films have been synthesized by dual ion beam sputtering (DIBS) deposition at the temperature below 100 °C. Ion bombardment influenced the metallographic morphology and crystalline orientation of TiN films. TiN film formed under N+ bombardment at low energy (<1 keV) consisted of fine crystal particles without texture. The film bombarded at 300 eV exhibited a hardness of 2750 kgf/mm2, which was an extremely high value for TiN films currently obtained by ion beam assisted deposition. The tribological tests demonstrated that TiN film synthesized by DIBS possessed good wear resistance.
No takes yet. Share an insight, caveat, or question.
Li et al. (1994) studied this question.
Synapse has enriched one closely related paper. Consider it for comparative context: