Microwave plasmatrons for giant integrated circuit processing

A method for calculating the interaction of a powerful microwave with a plane layer of magnetoactive low-pressure plasma under conditions of electron cyclotron resonance is presented. In this paper, the plasma layer is situated between a plane dielectric layer and a plane metal screen. The calculation model contains the microwave energy balance, particle balance, and electron energy balance. The equation that expressed microwave properties of nonuniform magnetoactive plasma is found. The numerical calculations of the microwave-plasma interaction for a one-dimensional model of the problem are considered. Applications of the results for microwave plasmatrons designed for processing giant integrated circuits are suggested.