Ferromagnetic Mn5Si3C0.8 and Mn5Ge3C0.8 films with Curie temperatures TC well above room temperature are obtained by C+12-ion implantation in antiferromagnetic Mn5Si3 or ferromagnetic Mn5Ge3. Patterning of the films with a gold mesh serving as a stencil mask during implantation allows a lateral modification of magnetic order creating ferromagnetic regions of Mn5Si3C0.8 which are embedded in antiferromagnetic Mn5Si3. This provides a procedure for the fabrication of magnetoelectronic hybrid devices comprised of different magnetic phases.
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Sürgers et al. (2008) studied this question.
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