Photobase generation from amineimide derivatives and their use for curing an epoxide/thiol system

The structural effects of amineimide derivatives on photobase generation and the use of the resultant base for thermal curing of an epoxide/thiol system are investigated. The results of UV spectral change and gas chromatographic‐mass spectrometric analysis indicated that amineimide derivatives undergo photolysis by UV irradiation and generate bases. The order of conversion of the photolysis for the functional groups introduced to amineimide derivatives was NO2 > N(CH3)2 > CN > OCH3 > H. By using aminimide derivatives with NO2 and N(CH3)2 groups, the curing of the epoxide/thiol system was shifted to lower temperature after UV irradiation.