An effective strategy for the preparation of intrinsic low- k and ultralow-loss dielectric polysiloxanes at high frequency by introducing trifluoromethyl groups into the polymers

Two new CF 3 -containing polysiloxanes with low dielectric constant ( D k ) and dielectric loss ( D f ) at a high frequency of 5 GHz were reported. The sample with two −CF 3 groups exhibits better dielectric properties with D k of 2.53 and ultralow D f of 1.66 × 10 −3 .