Accuracy and resolution of scanning electron microscopy and an electron-beam lithography system directly depend on beam diameter; it should be monitored and tuned frequently. A technique is described to determine beam size using an automatic procedure. In the developed method, a specially designed and fabricated test pattern is scanned using an e-beam. A spectrum of the signal is analyzed; beam diameter is automatically determined using a software program. Results of design, fabrication, and analysis of the beam calibration test pattern are presented.
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Babin et al. (2006) studied this question.
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