Structure and crystallization behaviour of thin Ni100-xPx (7 ≦ x < 32) alloy films, prepared by electroless and by galvanic deposition is studied by electron diffraction. Their properties depend strongly on the metal substrate. Alloys with an intermediate P content show a strong composition gradient in the vicinity of the alloy substrate interface. However, the results of the diffraction studies indicate that the crystallization behaviour is only determined by the mean composition of the alloy films. For the higher concentration regime (x > 25) final crystallization products are Ni12P5 + Ni3P (25 < x < 29.4) and Ni12P5 + Ni2P (29.4 < x < 33.3), respectively.
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Pittermann et al. (1986) studied this question.
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