Patterning Semiconductor Nanocrystals in Polymer Films

This paper reports a method of patterning semiconductor nanocrystals (NCs) in a polymer film. By combining lithographic concept with polymerization‐induced phase separation in a NC‐monomer mixture, we produced topographic and lateral compositional patterns in NC‐polymer films. The quality of the patterns was controlled by the competition between the rate of polymerization‐induced phase separation and the change in viscosity of the polymerizing mixture.