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In the present research, we propose a method of controlling the photoelastic constant using surface acoustic waves. A Bragg diffraction is carried out to determine the photoelastic constants of Nb2O5. As a result, it is confirmed that the photoelastic constant of Nb2O5 thin film undergoing a sputtering process, during which surface acoustic waves were excited on the substrate, was about 3 to 6 times larger than those of thin films on which surface acoustic waves were not excited.
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Nakagawa et al. (1993) studied this question.
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