A new photosensitive negative-tone inorganic-organic hybrid SiO 2 /TiO 2 glass is investigated for fabrication of microoptical elements. The sol-gel material enjoys an advantage over the conventional photoresist-based fabrication techniques due to its single-step process without etching. The application of the high-energy beam-sensitive (HEBS) mask in the process provides a reliable and simple method for three-dimensional microoptical fabrications in a single UV exposure. The technique using the sol-gel material with the HEBS grey-scale mask has considerable potential for low-cost mass production of complex, multilevel, diffractive optical elements and microoptical structures.
No takes yet. Share an insight, caveat, or question.
Yuan et al. (2001) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: