Forming a beam of ions extracted from glow-discharge plasma

In plasma-emitting structures based on glow-discharge, the potential difference between the ion-emitting plasma and the screening electrode of an ion-optic system depends on particular features of the electrode system of glow discharge and can vary in a range 0–1 kV. Results are presented of an experimental study and computer simulation of the formation of ion beams with ion energy 0–1 keV and current density 1–10 mA/cm 2 in ion sources based on such structures.