Answers are grounded in this paper and cite their sources.
The titanium thin films obtained by magnetron sputtering with the rotating substrate at different distances between the substrate and magnetron centers were studied with regard to the uniformity of the film thickness distribution. On the basis of the experimental data obtained, the model for the magnetron film deposition during substrate rotation was developed. The analysis of the simulation results shows that the model error is not greater than 10%.
No takes yet. Share an insight, caveat, or question.
Голосов et al. (2016) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: