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November 1, 1984Japanese Journal of Applied Physics

Low-Temperature Growth of Silicon Dioxide Film by Photo-Chemical Vapor Deposition

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Authors

YTYasuo TaruiOsaka Institute of Technology JHJunichi HidakaTokyo University of Agriculture and Technology KAKatsumi AotaIwate University

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Tarui et al. (1984) studied this question.

synapsesocial.com/papers/6aa57ee59feada129378e50c https://doi.org/10.1143/jjap.23.l827

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1An Improved Method of Measuring the Zeeman Shift in Cesium Beam Frequency Standards1984 · 12 citations