Atmospheric pressure chemical vapour deposition of WO3 thin films from a volatile fluorinated tungsten oxo‐alkoxide precursor, W(O)(OCH2CF3)4

The monomeric tungsten oxo‐fluoroalkoxide W(O)(CH2CF3)4 (1) was synthesized from W(O)Cl4 and CF3CH2OH in the presence of ammonia. It was used in atmospheric pressure chemical vapour deposition experiments to deposit non‐stoichiometric WO2.9 when used as a single‐source precursor or stoichiometric WO3 when O2 was used as co‐reagent.