Highly Conformal Deposition of Pure Co Films by MOCVD Using Co[sub 2](CO)[sub 8] as a Precursor

Highly Conformal Deposition of Pure Co Films by MOCVD Using Co2 ( CO ) 8 as a Precursor, Lee, J., Yang, H. J., Lee, J. H., Kim, J. Y., Nam, W. J., Shin, H. J., Ko, Y. K., Lee, J. G., Lee, E. G., Kim, C. S.