In this article, a spectroscopic ellipsometer is constructed in rotating polarizer and analyzer configuration. Instead of continuous rotation and integration for waveform analysis, a step and scan method was adopted for both the rotating polarizer and the rotating analyzer and Fourier analysis was used for the waveform analysis. In this system, the polarizer and the analyzer rotate in opposite directions with the same angular speed. The transmission axes of the two elements are rotated using microstepping motors. The accuracy of the constructed ellipsometer is tested using two ellipsometry standards with different thicknesses. Commercial software for thin film analysis (TFCompanion‐optical metrology software) obtained from Semiconsoft, Inc. is used to analyze the experimental results. The results reveal a high accuracy device for thin film characterization.
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El‐Agez et al. (2014) studied this question.
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