Excimer-laser microetching of a variety of materials is applied to the fabrication of surface-relief optical microstructures of arbitrary morphology, with particular emphasis on computer-generated holographic structures. High-definition, high-radiation-intensity selective laser ablative etching in conjunction with step-and-repeat (period) replication or raster (pixel) scanning is used. To support such developments, the characteristic etching properties of a wide range of solid materials, from metals to semiconductors and polymers, are studied. Optical-interconnect and generic object holograms are produced by means of this alternative one-step holographic information-recording method.
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Vainos et al. (1996) studied this question.
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