BN was deposited on Al 2 O 3 substrates from the BCl 3 ─NH 3 ─Ar reagent system. An impinging jet reactor configuration was used to obtain kinetic data in the temperature range of 800° to 1000°C and in the pressure range of 4 to 20 kPa. The BN deposition could be described by a simple kinetic rate expression with an activation energy of about 39 kcal/mol and a first‐order dependency on BCl 3 concentration. The BN deposition rate increased with temperature, pressure, and BCl 3 concentration. The microstructure of the BN coatings was not strongly influenced by the process parameters.
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Lee et al. (1991) studied this question.
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