Novel Photobase Generators and Their Application to Photopolymers

NovelPhotobaseGeneratorsandTheirApplicationto Photopolymers KojiArimitsu＊，AyumuKushimaandRyosukeEndo か甲αr励e〃Jq／P〟柁α〃d4pJねdCゐem如堺飽C〟妙q／旋ね〃Ceα〃d花C／7〃0わ那 花砂oUわルer砂砂 rkね〃Ce，2647 ∽∽ α毎毎胸みC鋸α278-85川J毎フα〃 αr加地〟＠相．〃0血．J〟ぶ．αC：加 Keywords：PhotobasegeneratoIちPhotodecarboxylation，ketoprofbn，amine 1．Introduction Only a fbw articles have mentioned Photoreactive materials relying onbase-Catalyzed transfomations although alarge number of investlgations concemlng analogous systems utilizlng aCid-Catalyzed reactions such as Chemicallyamplinedphotoresistsl1］andcationic UVIcuringmaterialsl2］havebeenreported．This is probably due to relativelylow quantumyields for photobase generation，leading to low Photosensitivity of photoreactive materials SenSitized with photobase generators．Many of the photobase generators reported are generally PreParedviaseyeralsyntheticsteps・［3-5］Onthe Other hand，itlS Wellknown that ketoprofbn(1) undergoesphotodecarboxylationreactionwithhigh quantumyielduponUVlirradiation(Schemel)．［6］ If a salt comprlSlng ketoprofbn and a base molecule could undergo photodecarboxylation reaction，afreebaseshouldbeproducedwithhigh efnciency．Thisidealed us to carry out the molecular deslgn Ofnovelphotobase generators， cooH ：B C00 H：B