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Effect of Oxide Charge Trapping on X-ray Photoelectron Spectroscopy of HfO2/SiO2/Si Structures, Abe, Yasuhiro, Miyata, Noriyuki, Ikenaga, Eiji, Suzuki, Haruhiko, Kitamura, Koji, Igarashi, Satoru, Nohira, Hiroshi
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Abe et al. (2009) studied this question.
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