Features of the formation of layers on the surface of valve metals in the process of ion beam assisted deposition of metals from vacuum arc discharge plasma

Layers on the surface of aluminum, aluminum alloy, titanium and tantalum was formed by ion beam assisted deposition of metals. Formation of layers in ion beam assisted deposition mode, by means of the deposition of metal and mixing of precipitating layer with the substrate by accelerated (U = 20 kV) ions of the same metal from metal vapor and ionized plasma of vacuum (~10– 2 Pa) pulsed electric arc discharge, was carried out. Multicomponent amorphous layers containing atoms of the deposited metal, components of the substrate material, including oxygen of the surface oxide film, as well as hydrocarbon molecules as impurities were obtained. It is established that during ion beam assisted deposition of metals with getter properties (Zr, Cr, Er, Dy, etc.) on the surface of the studied materials, significant amounts of gases are captured from the residual atmosphere of the vacuum working chamber and are included in the composition of the formed layer. At the same time, the content of atoms of the substrate material in the layer is small. With ion beam assisted deposition of metals that do not exhibit getter properties, the content of impurities in the resulting layers is significantly less, their composition contains atoms of the deposited metal and the substrate material.