Patterning of graphene for flexible electronics with remote atmospheric-pressure plasma using dielectric barrier

We show results of the patterning of graphene layers on poly(ethylene terephthalate) (PET) films through remote atmospheric-pressure dielectric barrier discharge plasma. The size of plasma discharge electrodes was adjusted for large-area and role-to-role-type substrates. Optical emission spectroscopy (OES) was used to analyze the characteristics of charge species in atmospheric-pressure plasma. The OES emission intensity of the O 2 * peaks (248.8 and 259.3 nm) shows the highest value at the ratio of due to the highest plasma discharge. The PET surface roughness and hydrophilic behavior were controlled with CDA flow rate during the process. Although the atmospheric-pressure plasma treatment of the PET film led to an increase in the FT-IR intensity of C–O bonding at 1240 cm −1 , the peak intensity at 1710 cm −1 (C=O bonding) decreased. The patterning of graphene layers was confirmed by scanning electron microscopy and Raman spectroscopy.