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The initial stages of WF6 and TaF5 adsorption on SiO2 and polyimide surfaces were investigated by photoelectron spectroscopy. WF6 selectively adsorbs on Si relative to SiO2 and polyimide, while TaF5 exhibited nonselective adsorption behavior. This trend is explained by differences in molecular structure and suggests a general basis for predicting selective deposition.
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McFeely et al. (1990) studied this question.
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