Spin‐on glass (SOG) coating solutions containing various amount of Si — CH 3 were synthesized by hydrolytic polymerization from monomers of tetramethoxysilane and methyltrimethoxysilane. Film properties of the SOG film formed from the synthesized coating solutions were evaluated as a function of Si — CH 3 concentration. The film shrinkage linearly decreased with the Si — CH 3 content, and it became zero when the Si — CH 3 concentration was 100%. Water absorption as well as dielectric constant of the film decreased with increasing Si — CH 3 content. Fourier transform infrared spectroscopy showed that this tendency can be attributed to the decrease of Si—OH content, which decreased with an increase of Si — CH 3 content. Si—OH in SOG film causes a high shrinkage of the film due to its heat‐induced polycondensation. Si—OH is also the origin of a high dielectric constant and water absorption because of its high polarization. Therefore, SOG with a high organic content is preferred.
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Nakano et al. (1995) studied this question.