The products in inductively coupled plasma excited in organosilicic compounds were studied on chemical structures by spectroscopic methods. Plasma‐polymerized tetramethylsilane (PA) contains not only SiCH3 groups but also SiH groups on IR and 29Si‐NMR analyses. 13C‐NMR spectrum of PA reveals that the crosslinked structure of PA is mainly constructed of Ch2 and CH groups. Plasma‐polymerized octamethyleyclotetrasiloxane (PD4) is composed of SiCH3 and SiO groups. 13C‐ and 29Si‐NMR spectra of PD4 point out the highly preservation of the structural units similar to the monomer. These data of PD4 suggest that PD4 is formed from the ring‐opening polymerization by cleavages of SiO bonds. 13C‐NMR spectrum of poly[methyltrimethoxysilane] (PT) indicates the existence of CH3O groups, meanwhile its 29Si‐NMR analysis concludes that PT is chiefly composed of the structural units similar to the monomer. The surface analyses by XPS of PA, PD4 and PT suggest that these organosilicic plasma polymers resemble their starting materials.
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Tajima et al. (1987) studied this question.
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