The authors fabricated a nanoporous alumina template with an electrochemical anodization process and implemented this template as a mask for the nanopatterning process onto the GaN surface of an InGaN/GaN multi-quantum-well structure. The fabricated nanohole structure shows a locally ordered periodicity of a photonic crystal slab with an averaged hole distance of 105 nm and hole diameter of 60 nm. The nanohole array as a subwavelength grating shows an enhanced intensity peak at 454.8 nm with enhanced optical interference indicating the formation of subwavelength nanohole diffraction grating.
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Kim et al. (2008) studied this question.
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