Based on the well-accepted electron-shading theory during plasma processing, we designed microstructures to control the local built-in electric-field on the substrate surface. The distortion magnitude of the electric-field is largest near the sidewalls of the microstructures, creating a horizontal electric-field in this region. We showed that the horizontally aligned carbon nanotubes (CNTs) were grown by making use of this built-in electric-field during the plasma-enhanced chemical vapor deposition process, with a tactical choice of geometries and materials of the microstructures on the substrate. This technique opens up a way to selectively and controllably grow horizontally aligned CNTs on the substrate surface.
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Chai et al. (2009) studied this question.
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