An anodized aluminum oxide nanopore has been used as an x-ray lithography mask to achieve a feature size of ∼35 nm on the polymethylmethacrylate photoresist. The mask was exposed using synchrotron radiation and demonstrates the feasibility of forming large arrays of regular nanostructures.
No takes yet. Share an insight, caveat, or question.
Knaack et al. (2004) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: