Organochromium precursors for low‐temperature OMCVD of chromium‐based coatings

Many organochromium compounds have been used as volatile chromium sources to prepare chromium‐based coatings by chemical vapor deposition. Chromium carbides, nitrides, oxides and alloys have been deposited on different substrates at low temperature (<500 °C). Organochromium precursors are reviewed and some of their draw‐backs are discussed. They are classified according to the nature of the chromium‐ligand bonds (carbonyls, amides, arenes or alkyls). Furthermore, experimental results obtained in the same apparatus for a series of representative precursors are reported to discuss, with literature data, how the ligand affects the composition and the structure of the films.