Perpendicular exchange bias in antiferromagnetic-ferromagnetic nanostructures

Exchange bias effects have been induced along the perpendicular-to-film direction in nanostructures prepared by electron beam lithography, consisting of a ferromagnetic [Pt/Co] multilayer exchange coupled to an antiferromagnet (FeMn). As a general trend, the exchange bias field and the blocking temperature decrease, whereas the coercivity increases, as the size of the nanostructures is reduced.