During crystal growth by vapor deposition, normal incident atoms are deflected toward three-dimensional surface structures. The effect becomes strong when the atoms are deposited with a low initial kinetic energy. At low T this steering effect induces an instability in the growth process, causing a perfectly flat surface to become rough after a few monolayers are deposited. Quantitative results for the initial stages of growth of Ag/Ag(100) at T~0 K are presented.
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Montalenti et al. (2001) studied this question.
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