In this study, nanosized aluminum (Al) thin films with different thicknesses were deposited on soda lime glass (SLG) substrates using the thermal sputtering technique for optoelectronic applications. Their optical properties were characterized using spectroscopic ellipsometry, a nondestructive method for analyzing film thickness, roughness, and optical constants. The results revealed that variations in film thickness significantly affected the refractive index and extinction coefficient. These changes were closely related to the microstructural differences and surface conditions. The findings highlight the potential of Al thin films for use in photonic and electronic devices, such as photodetectors and reflective coatings. This work provides valuable insight into the design of materials with tailored optical behavior.
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Ahmadova et al. (2025) studied this question.
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